Эта всеобъемлющая книга предоставляет подробное обсуждение основ очистки и подготовки поверхности для полупроводниковых применений, таких как очистка high-k/metal gate, очистка copper/low-k, удаление имплантатов с высокой дозой, пассивация кремния и SiGe. Рассматривается теория и фундаментальная физика, связанная с мокрым травлением и мокрой очисткой, а также поверхностные и коллоидные аспекты мокрой обработки. Представлены методология и практика разработки формуляций вместе с применениями для предотвращения коррозии меди, очистки алюминиевых линий и других чувствительных слоев. Эта книга является обязательной для любого инженера или менеджера, связанного с использованием или поставкой чистых и свободных от загрязнений технологий для производства полупроводников.
Reinhardt covers in detail the basics of cleaning for semiconductor production, whether you need to know high-K/metal gate editing, copper labelling, high storage department depiction, or silicon and Sigé manner, it's your place! She discloses the theory and fundamental sciences related to carrying on wet estimating and washing, together with the areas and screening dyes of noteworthy activity. One shows for well-founded advancement techniques and method, additionally the functioning hobbies for forestalling copper corrode, cleansing aluminium course and different delicate layers.
Электронная Книга «Handbook for Cleaning for Semiconductor Manufacturing. Fundamentals and Applications» написана автором Reinhardt Karen A. в году.
Минимальный возраст читателя: 0
Язык: Английский
ISBN: 9781118071731
Описание книги от Reinhardt Karen A.
This comprehensive volume provides an in-depth discussion of the fundamentals of cleaning and surface conditioning of semiconductor applications such as high-k/metal gate cleaning, copper/low-k cleaning, high dose implant stripping, and silicon and SiGe passivation. The theory and fundamental physics associated with wet etching and wet cleaning is reviewed, plus the surface and colloidal aspects of wet processing. Formulation development practices and methodology are presented along with the applications for preventing copper corrosion, cleaning aluminum lines, and other sensitive layers. This is a must-have reference for any engineer or manager associated with using or supplying cleaning and contamination free technologies for semiconductor manufacturing. From the Reviews… «This handbook will be a valuable resource for many academic libraries. Many engineering librarians who work with a variety of programs (including, but not limited to Materials Engineering) should include this work in their collection. My recommendation is to add this work to any collection that serves a campus with a materials/manufacturing/electrical/computer engineering programs and campuses with departments of physics and/or chemistry with large graduate-level enrollment.» —Randy Wallace, Department Head, Discovery Park Library, University of North Texas
